Your selections:
Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography
- Ghalehbeygi, Omid T., O'Connor, John, Routley, Ben S., Fleming, Andrew J.
A nonlinear programming approach to exposure optimization in scanning laser lithography
- Fleming, Andrew J., Wills, Adrian, Ghalehbeygi, Omid T., Routley, Ben, Ninness, Brett
Optimization and simulation of exposure pattern for scanning laser lithography
- Ghalehbeygi, Omid T., Berriman, Garth, Fleming, Andrew J., Holdsworth, John L.
Are you sure you would like to clear your session, including search history and login status?